Surface silanization
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United States of America Patent
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N/A
Issued Date -
Mar 3, 2005
app pub date -
Jul 6, 2004
filing date -
Apr 1, 2002
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Plasma is generated in a chamber to clean a surface of a substrate. Vapor of an un-ionized organosilane compound is introduced into the same chamber to silanize the cleaned surface via a silane condensation reaction. A layer of covalently bonded organosilane molecules having functional groups is thus produced on the substrate surface. The substrate is then cured by a baking process.
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