Spacer chalcogenide memory method

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Apr 25, 2006
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Nov 8, 2004
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Aug 9, 2002

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Abstract

The present invention includes devices and methods to form memory cell devices including a spacer comprising a programmable resistive material alloy. Particular aspects of the present invention are described in the claims, specification and drawings.

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MACRONIX INTERNATIONAL CO., LTD.

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Lung, Hsiang Lan	Hsinchu, TW	118	7064

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Spacer chalcogenide memory method

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United States of America Patent

10983375

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US Family Size	Non-US Coverage
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DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 25, 2006	US,7033856,B2 US7033856B2	GRANTED PATENT AS SECOND PUBLICATION
March 24, 2005	US,20050062074,A1 US20050062074A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	7033856
SERIAL NO	10983375
DOCKET NO

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10983375

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