Lithographic apparatus and device manufacturing method
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United States of America Patent
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Aug 12, 2008
Grant Date -
Mar 31, 2005
app pub date -
Sep 22, 2004
filing date -
Sep 22, 2003
priority date (Note) -
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Abstract
One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
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