Sub-micron-scale patterning method and system
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United States of America Patent
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Issued Date -
Apr 21, 2005
app pub date -
Aug 19, 2004
filing date -
Aug 19, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method for replicating a nanopattern is disclosed. This method includes identifying a substrate; coating a surface of the substrate with a liquid layer; positioning a mold having a plurality of recesses defining a negative of the nanopattern in sufficient proximity with the coated liquid layer to cause the liquid layer to self-fill at least a portion of the plurality of recesses of the mold; and, chemically transforming the liquid layer to enable the transformed film to substantially retain the nanopattern.
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