Use of coefficient of a power curve to evaluate a semiconductor wafer
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 31, 2006
Issued Date -
N/A
app pub date -
Oct 29, 2004
filing date -
Mar 5, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A coefficient of a function that relates a measurement from a wafer to a parameter used in making the measurement (such as the power of a beam used in the measurement) is determined. The coefficient is used to evaluate the wafer (e.g. to accept or reject the wafer for further processing), and/or to control fabrication of another wafer. In one embodiment, the coefficient is used to control operation of a wafer processing unit (that may include, e.g. an ion implanter), or a heat treatment unit (such as a rapid thermal annealer).
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully