Method of forming a mask on surface
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United States of America Patent
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-
N/A
Issued Date -
Apr 28, 2005
app pub date -
Dec 17, 2004
filing date -
Nov 2, 2001
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method of forming a mask on a surface utilises the technique of drop on demand ejection to deposit selectively material on said surface. The method comprises the steps of depositing material on said surface to form an outline of the mask on the surface; and subsequently depositing material within said outline to form said mask. Alternatively, the method comprises the steps of depositing material on said surface to form an outline of those parts of the surface on which material is not to be deposited, and subsequently depositing material outside of said outline to form said mask. The formed outline has a greater height than the remainder of the mask so as to provide a barrier for controlling the flow of material subsequently deposited on the surface.
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