Method and device for vacuum-coating a substrate
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United States of America Patent
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May 17, 2011
Grant Date -
May 12, 2005
app pub date -
Dec 9, 2004
filing date -
Jun 16, 1997
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Abstract
A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.
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