Source gas flow control and CVD using same
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United States of America Patent
Stats
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N/A
Issued Date -
May 12, 2005
app pub date -
Aug 27, 2004
filing date -
Aug 28, 2003
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A source-gas supply apparatus for supplying a source gas into a CVD reactor includes: a reservoir for storing a liquid material; a gas flow path connected the reservoir and the CVD reactor; a sonic nozzle disposed in the gas flow path, through which the source gas is introduced into the CVD reactor; a pressure sensor disposed in the gas flow path upstream of the sonic nozzle; a flow control valve disposed in the gas flow path upstream of the pressure sensor; and a flow control circuit which receives a signal from the pressure sensor and outputs a signal to the flow control valve to adjust opening of the flow control valve as a function of the signal from the pressure sensor.
First Claim
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- C01B:NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- F02M:SUPPLYING COMBUSTION ENGINES IN GENERAL WITH COMBU....
- C10K:PURIFYING OR MODIFYING THE CHEMICAL COMPOSITION OF....
- F24F:AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION;....
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