Method and apparatus for fabricating a conformal thin film on a substrate
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United States of America Patent
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Jul 4, 2006
Grant Date -
May 12, 2005
app pub date -
Nov 12, 2003
filing date -
Nov 12, 2003
priority date (Note) -
Expired
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Abstract
A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system. The gas is flowed through a diffuser plate adjacent to the expansion volume and a reaction chamber. The diffuser plate includes a protrusion located opposite the gas inlet and the protrusion reduces turbulence in the expansion volume.
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