System and method for non-destructive implantation characterization of quiescent material
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United States of America Patent
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Issued Date -
May 26, 2005
app pub date -
Nov 26, 2003
filing date -
Nov 26, 2003
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Abstract
Light from a light source is directed towards a plurality of measurement points on a substrate to characterize the substrate based on light reflectivity. In a differential approach, light is directed onto the substrate before and after dopant implantation. Reflected light is detected and analyzed for spectral distribution and intensity. A differential measurement is derived, from which implantation uniformity is determined.
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