High selectivity colloidal silica slurry

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United States of America Patent

PATENT NO 6964600
APP PUB NO 20050113000A1
SERIAL NO

10717480

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Abstract

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Provided is a novel high selectivity aqueous slurry composition method of utilizing same. The composition includes non-modified silica based abrasive particles in an amount of about 5 to about 50 weight percent, and an organic compound in an amount of about 0.001 to about 2.0 weight percent in an aqueous solution, wherein the silicon oxide to silicon nitride selectivity ratio ranges from about 50 to about 700.

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Patent Owner(s)

Patent OwnerAddress
AKZO NOBEL CHEMICALS INTERNATIONAL B V6824 BM ARNHEM

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Belov, Irina Zionsville, IN 16 149
Hunt, Thomas J Peekskill, NY 42 682
Passing, Gerd W Hürth, DE 1 4
Puppe, Lothar Burscheid, DE 63 826

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