Air cleaning system for semiconductor manufacturing equipment
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United States of America Patent
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-
Apr 4, 2006
Grant Date -
May 26, 2005
app pub date -
Nov 10, 2004
filing date -
Nov 11, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A cleaning system for n semiconductor manufacturing equipment includes a working area and a service area. A wafer process area in the service area performs a semiconductor manufacturing process. A wafer transfer area is spatially connected to the wafer process area, and transfers a wafer from the working area to the wafer process area. An air supply device supplies clean air to the wafer transfer area and the wafer process area. A particle measurer continuously checks for any malfunction or defect of the air supply device, and measures in real time an impurity particle count of the air in the wafer transfer area so as to detect any abnormally high pollution level in the wafer transfer area.
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