Self-learning method and system for detecting abnormalities
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United States of America Patent
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Nov 24, 2009
Grant Date -
Jun 9, 2005
app pub date -
Oct 16, 2003
filing date -
May 22, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present invention is directed to a method and system for use in a computing environment to monitor parameters and detect abnormalities. A monitoring system for monitoring a process may include a signature creation module for creating a signature representative of the process, a signature updating module for continuously updating the created signature, and an abnormality detection module for detecting abnormalities based upon deviations from the updated signature. The system may perform a method for detecting abnormalities occurring during a process based upon the continuously updated signature representative of the process. The method may include continuously monitoring a system parameter and computing a normal range of values for the system parameter based on the continuously updated signature. The method may additionally include determining if the monitored system parameter is within the normal range and indicating existence of an abnormality if the monitored system parameter is outside of the normal range.
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