Lithographic apparatus and device manufacturing method, and measurement systems
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United States of America Patent
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N/A
Issued Date -
Jun 16, 2005
app pub date -
Oct 22, 2004
filing date -
Oct 22, 2003
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The invention pertains to a lithographic apparatus including a radiation system configured to condition a beam of radiation; a projection system configured to project the beam of radiation onto a target portion of a substrate; a displacement device configured to move the moveable object relative to the projection system in substantially a first direction and a second direction differing from the first direction; and a measuring device configured to measure a displacement of the moveable object in a third direction, which is substantially perpendicular to the first direction and to the second direction, wherein the measuring device may include an encoder system.
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