Silicon solar cell and production method thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7495167
APP PUB NO 20050133084A1
SERIAL NO

10960517

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Abstract

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BSF structure using solar grade silicon substrate, having a life time close to the initial level of the substrate.The solar cell of the present invention is produced by a back side boron diffusion step for diffusing boron on a back side of the substrate, a front side phosphorus diffusion step for diffusing phosphorus on a front side of the substrate, a low-temperature annealing step for annealing the substrate at 600° C. or lower for 1 hour or more, and an electrode firing step carried out at a peak temperature of 700° C. or lower for 1 minute or less, carried out in this order.

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Patent Owner(s)

Patent OwnerAddress
HITACHI LTDJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Araki, Ichiro Hitachinaka, JP 2 95
Hosoya, Tomonori Hitachi, JP 3 89
Joge, Toshio Hitachi, JP 2 101

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