Method and structure for protecting an alignment mark
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United States of America Patent
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-
N/A
Issued Date -
Jun 23, 2005
app pub date -
Jun 14, 2004
filing date -
Dec 23, 2003
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method and structure for protecting alignment marks. A substrate comprising a plurality of alignment marks is provided, wherein the alignment mark comprises a plurality of trenches. A plurality of protective patterns are formed on the substrate by depositing a protective layer and patterning the same to protect the alignment marks from damage during subsequent CMP process.
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