Polishing composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jun 30, 2005
app pub date -
Dec 24, 2003
filing date -
Dec 24, 2003
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A polishing composition of the present invention includes alumina, colloidal silica, citric acid, an organic acid other than citric acid, an oxidizing agent, and water. When the polishing composition is used in polishing the surface of a substrate for a magnetic disk, the substrate is polished at a high rate, and the substrate after polishing has reduced surface defects.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully