Pattern analysis method and pattern analysis apparatus
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United States of America Patent
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Issued Date -
Jun 30, 2005
app pub date -
Nov 24, 2004
filing date -
Nov 26, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A pattern analysis method includes: a first step of preparing pattern layout data including a plurality of first regions and a plurality of second regions; a second step of selecting either said plurality of first regions or said plurality of second regions as a target region in which a critical area of said pattern layout data is to be calculated; and a third step of extracting, from said target region, rectangular regions each having a width within a given range. The method further includes; a fourth step of obtaining a total area of said rectangular regions; and a fifth step of calculating said critical area by using said total area.
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