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Abstract

A maskless pattern generating system for use in lithography includes a light source that generates a light beam, a programmable pattern generator that generates a pattern image from the light beam based on a control signal input, and a controller to provide the control signal input to the programmable pattern generator based on pattern information provided to the controller. The control signal input instructs the programmable pattern generator to set individual voltage levels corresponding to individual pixels in a pixel array, wherein each of the individual voltage levels corresponds to a greyscale level assigned to a particular individual pixel. Setting the individual voltage levels provide a phase shift of the resulting pattern image beam, allowing the programmable pattern generator to act as a phase shift mask. This maskless pattern writing system acts as a light valve to control pattern imagery, on a pixel by pixel basis, for the purposes of direct writing patterns.

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First Claim