Deposition apparatus and a deposition method using medium in a supercritical state
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United States of America Patent
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Issued Date -
Jul 21, 2005
app pub date -
Dec 22, 2004
filing date -
Dec 25, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A deposition apparatus for supplying a process medium including a medium in a supercritical state and a precursor to a processed substrate so that the processed substrate is deposited on, includes a process vessel, a support stand which is provided in the process vessel, is configured to support the processed substrate, and include a heating part, a medium supply part which is connected to the process vessel via a medium supply path and supplies the process medium to the process vessel, and a medium reflux path configured to reflux the process medium supplied to the process vessel to the medium supply part. The medium supply part includes a first temperature control part configured to control a temperature of the process medium.
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