Lithographic apparatus and device manufacturing method

United States of America Patent

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Mar 13, 2007
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Aug 18, 2005
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Feb 18, 2004
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Feb 18, 2004

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Abstract

Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.

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ASML NETHERLANDS B.V.

International Classification(s)

G03B:APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS O....

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Inventor Name	Address	# of filed Patents	Total Citations
Bleeker, Arno Jan	Westerhoven, NL	99	2903
De, Jager Pieter Willem Herman	Rotterdam, NL	83	1211
Gui, Cheng-Qun	Best, NL	55	482
Sytsma, Joost	Eindhoven, NL	4	52

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Lithographic apparatus and device manufacturing method

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United States of America Patent

10779823

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PATENT NO	7190434
APP PUB NO	20050179884A1
SERIAL NO	10779823
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
March 13, 2007	US,7190434,B2 US7190434B2	GRANTED PATENT AS SECOND PUBLICATION
August 18, 2005	US,20050179884,A1 US20050179884A1	FIRST PUBLISHED PATENT APPLICATION

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10779823

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