Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
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United States of America Patent
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Aug 8, 2006
Issued Date -
N/A
app pub date -
Apr 8, 2005
filing date -
Jun 30, 1993
priority date (Note) -
Expired
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Abstract
An exposure apparatus includes a plurality of projection optical systems and a substrate stage. Each of the plurality of projection optical systems forms an exposure field on the substrate. The substrate stage holds the substrate and moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction. The plurality of projection optical systems and the substrate relatively move during an exposure field forming operation along the scanning direction.
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