Lithographic apparatus and device manufacturing method
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United States of America Patent
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Jun 13, 2006
Grant Date -
Sep 8, 2005
app pub date -
Mar 2, 2004
filing date -
Mar 2, 2004
priority date (Note) -
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Abstract
A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.
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