Exposure apparatus and method for producing device
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United States of America Patent
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N/A
Issued Date -
Oct 6, 2005
app pub date -
Jun 1, 2005
filing date -
Dec 10, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery unit 20 which recovers the liquid 50 outflowed to the outside of the substrate P. When the exposure process is performed in accordance with the liquid immersion method, the pattern can be transferred accurately while suppressing any environmental change even when the liquid outflows to the outside of the substrate.
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