High flow rate gaseous reactant supply
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Oct 6, 2005
app pub date -
Apr 2, 2004
filing date -
Apr 2, 2004
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A gaseous reactant supply apparatus for turning high flow rates of gaseous supply approximately 90 degrees and providing a uniform distribution of gaseous supply. The gaseous supply passes through a venturi throat. Straightening vanes can be positioned inside the venturi throat to reduce rotational motion the gaseous reactant supply may have upon entering the venturi throat. The gaseous reactant supply apparatus exhibits lower pressure drops than exhibited by apparatus of the prior art.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully