Enhancement of SiO2 deposition using phosphorus (V) compounds
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United States of America Patent
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Issued Date -
Oct 6, 2005
app pub date -
Mar 31, 2004
filing date -
Mar 31, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A process is defined for depositing a silica coating upon a heated glass substrate. The process includes providing a heated glass substrate having a surface upon which the coating is to be deposited. A precursor mixture comprising a silane, an oxygen source, a radical scavenger, a phosphorous (V) compound and an inert carrier gas is directed toward and along the surface to be coated. The mixture is reacted at or near the surface to form a silica coating on the surface of the glass substrate.
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