Metal-doped alumina and layers thereof

United States of America Patent

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Jan 6, 2009
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Oct 6, 2005
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May 17, 2005
filing date
Aug 28, 2002

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Abstract

A method of forming (and an apparatus for forming) a metal-doped aluminum oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process.

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MICRON TECHNOLOGY, INC.

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C04B:LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREO....

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Inventor Name	Address	# of filed Patents	Total Citations
Vaartstra, Brian A	Nampa , US	158	9757

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Metal-doped alumina and layers thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11131165

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PATENT NO	7473662
APP PUB NO	20050221006A1
SERIAL NO	11131165
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
January 06, 2009	US,7473662,B2 US7473662B2	GRANTED PATENT AS SECOND PUBLICATION
October 06, 2005	US,20050221006,A1 US20050221006A1	FIRST PUBLISHED PATENT APPLICATION

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11131165

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