Wavelength filtering in nanolithography
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United States of America Patent
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Issued Date -
Oct 6, 2005
app pub date -
Feb 7, 2005
filing date -
Feb 5, 2004
priority date (Note) -
Abandoned
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Abstract
A device for creating nano-sized features on a substrate having an extreme ultra violet source, and a mask positioned between the extreme ultra violet source and a photosentive material coated substrate for limiting the wavelengths transmitted to the substrate, thereby forming nano-sized features on the substrate. A method of forming nano-sized features on a substrate by inserting a pre-designed mask between an extreme ultra violet source and a photosensitive material coated substrate, and illuminating the extreme ultra violet source through the mask onto the substrate, thereby etching the nano-features onto the substrate.
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