Method of making a tantalum layer and apparatus using a tantalum layer
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United States of America Patent
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Nov 4, 2008
Grant Date -
Oct 20, 2005
app pub date -
Apr 15, 2004
filing date -
Apr 15, 2004
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of making tantalum structures, including, creating a tantalum layer disposed on a first layer region of a first layer and on a second layer region of a second layer. The tantalum layer has a substantially bcc-phase tantalum region on the first layer region, and a non-bcc-phase tantalum region on the second layer region.
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