Implant and a method for treating an implant surface
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United States of America Patent
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Issued Date -
Oct 20, 2005
app pub date -
Dec 30, 2004
filing date -
Jul 19, 2002
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The invention relates to a method for treating an implant surface intended for implantation into bone tissue wherein a microroughness comprising pores and peaks having a pore diameter of .ltoreq.1 .mu.m, a pore depth of .ltoreq.500 nm, and a peak width, at half the pore depth, of from 15 to 150% of the pore diameter is provided. The invention also relates to an implant comprising a surface having the above characteristics.
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