Controlling electromechanical behavior of structures within a microelectromechanical systems device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 24, 2010
Grant Date -
Nov 10, 2005
app pub date -
Mar 25, 2005
filing date -
Sep 20, 2002
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully