Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same
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United States of America Patent
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Mar 13, 2007
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N/A
app pub date -
Aug 25, 2005
filing date -
Mar 17, 2002
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Abstract
An overlay vernier pattern for measuring multi-layer overlay alignment accuracy and a method for measuring the same is provided. A distance between a first alignment mark in a first material layer and a second alignment mark in an underlying second material layer is measured, so as to provide an alignment offset between the first material layer and the second material layer in addition, a distance between the second alignment mark in the second material layer and a third alignment mark in a third material layer underlying the second material layer is measured, so as to provide an alignment offset between the second material layer and the third material layer. The second alignment marks can be repeatedly used when measuring the alignment accuracy between the first and the second material layers measuring the alignment accuracy between the second and the third material layers.
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