Method for forming microlens of image sensor
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United States of America Patent
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Issued Date -
Dec 22, 2005
app pub date -
Mar 29, 2005
filing date -
Jun 18, 2004
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Disclosed is a method for forming a plurality of microlenses of an image sensor capable of making no gap between the plurality of the microlenses. The method for fabricating a microlens array includes the steps of: depositing a first photoresist layer on a semi-finished substrate; selectively patterning the first photoresist layer, thereby forming a first photoresist layer pattern; forming a plurality of first microlenses by flowing the first photoresist pattern; depositing a second photoresist layer on the first microlenses and the semi-finished substrate; forming a second photoresist pattern between the first microlenses by selectively patterning the second photoresist layer; and forming a plurality of second microlenses between the first microlenses by flowing the second photoresist pattern.
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