Compositions containing maleimide-substituted silsesquioxanes and methods for use thereof
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United States of America Patent
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Issued Date -
Jan 12, 2006
app pub date -
Jul 7, 2005
filing date -
Jul 7, 2004
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Abandoned
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Abstract
The present invention is based on the discovery that maleimide-substituted polyhedralsilsesquioxane compounds are useful as components in photosensistive resin compositions. These compounds can be readily prepared from available precursors, and are easily incorporated into resin compositions by appropriate formulating conditions. The incorporation of a variety of polyhedralsilsesquioxane frameworks into a photosensitive resin composition is readily accomplished via the crosslinkable maleimide moiety, which crosslinks under a variety of conditions (e.g., chemically and radiatively). Indeed, the compounds described herein contain at least one maleimide moiety attached to a polyhedralsilsesquioxane framework.
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