System for and method of ensuring accurate shadow mask-to-substrate registration in a deposition process
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United States of America Patent
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Issued Date -
Feb 2, 2006
app pub date -
Jul 28, 2004
filing date -
Jul 28, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A deposition system uses the same low coefficient of thermal expansion (CTE) material, for example, a CTE of below 10 ppm/.degree. C. in the temperature range of 0-200.degree. C., for forming both a shadow mask and a substrate upon which depositions occur in order to overcome the heating effects of a high-temperature deposition process, thereby ensuring a uniform expansion and contraction rate of the shadow mask and the substrate.
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