Enhanced magnetic shielding for plasma-based semiconductor processing tool
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United States of America Patent
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Issued Date -
Feb 2, 2006
app pub date -
Nov 16, 2004
filing date -
Jul 30, 2004
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Abandoned
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Abstract
Embodiments in accordance with the present invention relate to techniques for enhancing uniformity of plasma-based semiconductor processing. In one technique, the exterior of a plasma-based processing chamber features a series of substantially continuous plates composed of a material exhibiting a low permeability to magnetic fields. This high-.mu. shielding material is utilized to block exposure of a plasma within the chamber to the effects of external magnetic fields. Embodiments in accordance with the present invention are effective to shield plasma-based processing chambers from external magnetic fields originating from adjacent clustered chambers, and/or from the earth's geomagnetic field.
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