Slotted thin-film sputter deposition targets for ferromagnetic materials

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20060032740A1
SERIAL NO

11200930

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Abstract

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A slotted sputtering target for a magnetron sputtering system for thin-film deposition particularly suited for ferromagnetic target materials such as cobalt, nickel, and iron or an alloy including more than one of these elements.

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Patent Owner(s)

Patent OwnerAddress
WILLIAMS ADVANCED MATERIALS INC2978 MAIN STREET BUFFALO NY 14214

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Grohman, Henry L Wappingers Falls, NY 3 10
Willson, Matthew T New Milford, CT 5 30

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