Mirror process using tungsten passivation layer for preventing metal-spiking induced mirror bridging and improving mirror curvature
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United States of America Patent
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Issued Date -
Feb 23, 2006
app pub date -
Aug 23, 2004
filing date -
Aug 23, 2004
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Abandoned
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Abstract
A mirror process uses a tungsten passivation layer to prevent metal-spiking induced mirror bridging and improve mirror curvature. A mirror structure is patterned on a first sacrificial layer overlying a substrate. A tungsten passivation layer is then blanket deposited to cover the top and sidewalls of the mirror structure. A second sacrificial layer is formed overlying the tungsten passivation layer. A releasing process with an etchant including XeF.sub.2 is performed to remove the second sacrificial layer, the tungsten passivation layer and the first sacrificial layer simultaneously.
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