Integrated circuit lithography
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United States of America Patent
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Jan 5, 2010
Grant Date -
Mar 2, 2006
app pub date -
Aug 27, 2004
filing date -
Aug 27, 2004
priority date (Note) -
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Abstract
A method of generating an imaging pattern using a mask having a mathematical (e.g., Fourier-space) representation of an imaging pattern in an imaging plane. In addition to the foregoing, other method aspects are described in the claims, drawings, and text forming a part of the present application. Other methods and apparatuses are also disclosed.
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