Method of improving planarization of urethane polishing pads, and urethane polishing pad produced by the same

United States of America Patent

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Issued Date
Mar 2, 2006
app pub date
Aug 25, 2004
filing date
Aug 25, 2004

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Abandoned

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Abstract

For improving planarization of urethane polishing pads, at least one layer of the pad has a base resin and an isocyanate with a concentration within a range of 6.5-11.0 weight percent to obtain a high planarization property.

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Patent Owner(s)

Patent Owner	Address
JH RHODES COMPANY INC	2800 NORTH 44TH STREET SUITE 675 PHOENIX AS 85008

International Classification(s)

B24D:TOOLS FOR GRINDING, BUFFING, OR SHARPENING

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Halberg, Dwaine	Mesa, AZ	3	8
Renteln, Peter	San Ramon, CA	16	93

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Method of improving planarization of urethane polishing pads, and urethane polishing pad produced by the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10924832

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APP PUB NO	20060046627A1
SERIAL NO	10924832
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10924832

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