Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data
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United States of America Patent
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Apr 3, 2012
Grant Date -
Mar 9, 2006
app pub date -
Dec 3, 2004
filing date -
Dec 4, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
Various computer-implemented methods are provided. One method for generating a process for inspecting reticle layout data includes identifying a first region in the reticle layout data. A printability of the first region is more sensitive to changes in process parameters than a printability of a second region in the reticle layout data. The method also includes assigning one or more inspection parameters to the first region and the second region such that the first region will be inspected during the process with a higher sensitivity than the second region. Another method includes inspecting the first region with a higher sensitivity than the second region. An additional method includes simulating how the reticle layout data will print. Simulation of the first and second regions is performed with one or more different simulation parameters such that the first region is simulated with a higher fidelity than the second region.
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