Antireflective compositions for photoresists
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United States of America Patent
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Apr 6, 2010
Grant Date -
Mar 16, 2006
app pub date -
Jun 22, 2005
filing date -
Sep 15, 2004
priority date (Note) -
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Abstract
The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.
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