Methods, systems, and carrier media for evaluating reticle layout data
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United States of America Patent
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Mar 30, 2010
Grant Date -
Mar 23, 2006
app pub date -
Sep 14, 2005
filing date -
Sep 14, 2004
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Various computer-implemented methods are provided. One method for evaluating reticle layout data includes generating a simulated image using the reticle layout data as input to a model of a reticle manufacturing process. The simulated image illustrates how features of the reticle layout data will be formed on a reticle by the reticle manufacturing process. The method also includes determining manufacturability of the reticle layout data using the simulated image. The manufacturability is a measure of how accurately the features will be formed on the reticle. Also provided are various carrier media that include program instructions executable on a computer system for performing a method for evaluating reticle layout data as described herein. In addition, systems configured to evaluate reticle layout data are provided. The systems include a computer system and a carrier medium that includes program instructions executable on the computer system for performing method(s) described herein.
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