Method and system for contamination detection and monitoring a lithographic exposure tool and operating method for the same under controlled atmospheric conditions
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United States of America Patent
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Issued Date -
Mar 30, 2006
app pub date -
May 24, 2005
filing date -
Sep 30, 2004
priority date (Note) -
Abandoned
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Abstract
By using highly efficient detection techniques, such as chromatography and absorption spectroscopy, one or more contaminants may be identified and the concentration thereof may quantitatively be determined. In this way, the adverse effect on critical components of exposure tools, such as reticles and lenses in the form of, for instance, deposited inorganic salts, may significantly be reduced and the process performance may be enhanced.
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