Portable conformable deep ultraviolet master mask
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United States of America Patent
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Issued Date -
Apr 6, 2006
app pub date -
Sep 28, 2004
filing date -
Sep 28, 2004
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Abstract
Mastering techniques are described that can improve the quality of a master used in data storage disk manufacturing. In particular, the techniques can improve resolution of the features created on the master. The techniques include coating a master substrate layer with a tri-layer structure composed of a top photoresist layer, a bottom photoresist layer, and a non-resist layer interposed between the two photoresist layers. The bottom photoresist layer comprises a deep ultraviolet (DUV) resist material. Mastering the top photoresist layer defines a portable conformable mask (PCM) for the bottom photoresist layer. A variety of PCM may be defined for the bottom photoresist layer. The PCM may be defined using conventional tip recording with a focused laser spot that provides fine feature definition. A blanket DUV light may then illuminate the bottom photoresist layer through the PCM to provide enhanced feature resolution in a data storage disk master.
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