Polishing pad conditioner with shaped abrasive patterns and channels
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United States of America Patent
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Jun 27, 2006
Grant Date -
Apr 13, 2006
app pub date -
Oct 12, 2004
filing date -
Oct 12, 2004
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A polishing pad conditioner comprises a base and a pad conditioning face on the base. The conditioning face comprises central and peripheral regions. Abrasive spokes having a substantially constant width of abrasive particles, extend from the central to the peripheral region. The spokes are symmetric and radially spaced apart from one another, and may have a variety of shapes. The conditioning face can also have a cutout inlet channel to receive polishing slurry when the conditioning face is rubbed against a polishing pad, a conduit to receive the polishing slurry from the cutout inlet channel, and an outlet on the peripheral edge of the base to discharge the received polishing slurry.
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