Dynamic illumination uniformity and shape control for lithography
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United States of America Patent
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N/A
Issued Date -
Apr 27, 2006
app pub date -
Oct 25, 2004
filing date -
Oct 25, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A subsystem for an exposure apparatus has at least one array of tilting mirrors placed in either an image reticle plane or a conjugate image plane to provide dynamic control of an illumination beam through an exposure field. In the system, an optical subsystem and a plurality of mirrors directs light to a reticle and a sensor senses the illumination distribution of the light at a wafer stage. When the at least one array of tilting mirrors is placed in the image reticle plane, a control is used to interpolate data of the illumination distribution sensed by the sensor, and then control movement of at least one mirror of the array of mirrors based on the interpolated data.
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