Treating apparatus
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United States of America Patent
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N/A
Issued Date -
Jun 1, 2006
app pub date -
Dec 1, 2005
filing date -
Dec 1, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A treating apparatus for spreading treatment gas uniformly all over a to-be-treated substrate mounted on a substrate mount while controlling the heat transfer rate between the substrate and the substrate mount to thereby uniformize the temperature of the to-be-treated substrate over the whole surface thereof. A porous substrate having a large number of communicating pores serves as the mount for treating the to-be-treated substrate mounted on the substrate mount disposed in a vacuum vessel while controlling the temperature of the to-be-treated substrate into a predetermined temperature. In the porous substrate, a large number of communicating pores are formed in a substrate to communicate with one another in all directions. The treatment gas diffuses uniformly from below through the communicating pores and spouts upward. An electrostatically chucking electrode is buried in a gas-permeable insulating film. The porous substrate is peripherally coated with a heat resistant insulating film of ceramics etc.
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