Importance

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Abstract

A molecule supply source for use in thin-film forming, enabling to form a thin-film, having a high uniformity, with molecules discharged from a single evaporation source, even on a relatively wide film-forming surface 9, has guide passages 4a, 4b and 4c, being provided in plural numbers thereof, wherein flow rates and directional properties of the vapor molecules are controlled by those guide passages 4a, 4b and 4c; thereby, improving distribution on film-thickness, which are formed on the film-forming surface 9 of a substrate 8. With this, a necessary amount of film-forming material can reach to necessary portions on the film-forming surface 9 of the substrate 8, and therefore, it is possible to reduce dispersion in the film-thickness of the thin-film formed on the film-forming surface 9, but without rotating and/or moving the film-forming surface 9, and thereby enabling to obtain the thin-film, having the uniform film-thickness. Further, it is also possible to control the film-thickness at an arbitrary portion on the film-forming surface 9, freely, but up to a certain degree.

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First Claim