Lithographic apparatus and device manufacturing method
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United States of America Patent
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Mar 25, 2008
Grant Date -
Jun 22, 2006
app pub date -
Dec 17, 2004
filing date -
Dec 17, 2004
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and a throughput of the system optimized.
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